Unsurpassed resolution on a routine basis

Progress during CELINA has enabled the sub-10 nm pattern transfer using masks fabricated by FEBID:

• Marijke Scotuzzi, Martin J. Kamerbeek, Andy Goodyear, Mike Cooke, Cornelis W. Hagen:
  Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition,
  J. Micro/Nanolith. MEMS MOEMS 14 (3) (2015) 031206.

More unconventional approaches to size reduction have also been demonstrated. For instance, the contribution to deposit formation of SEs exiting from the underlying substrate in areas outside the beam focus can be diminished by suitably tailored organic adlayers. Also, such layers suppress catalytic activity of a surface that counteracts the spatial selectivity of FEBID:

• M. Drost, F. Tu, F. Vollnhals, I. Szenti, J. Kiss, H. Marbach:
  On the Principles of Tweaking Nanostructure Fabrication via Focused Electron Beam Induced Processing Combined with Catalytic Processes,
  SMALL Methods 1 (2017) 1700095.

Also, ultrathin substrates have been brought forward with regards to their potential for significantly reduced deposit broadening by backscattered electrons:

• Andrey Turchanin, Armin Gölzhäuser:
  Carbon Nanomembranes,
  Adv. Mater. 28 (2016) 6075–6103.